PROGRAM
Days: Monday, September 30th Tuesday, October 1st Wednesday, October 2nd Thursday, October 3rd Friday, October 4th
Monday, September 30th
View this program: with abstractssession overviewtalk overview
09:00-10:45 Session 1: Opening Plenaries
Chairs:
Location: Exhibit Hall C
09:00 | Welcome Remarks |
09:10 | Silicon Carbide MOSFETs: A Device Designer's Perspective |
09:55 | Latest Power Electronics Technology with SiC Devices to Realize a Carbon-Neutral Society |
10:45-11:00 Session 2: Invited Posters
Chairs:
Influence of the Temperature Gradient on the Defect Formation in the Initial Stage of PVT Growth (abstract) PRESENTER: Yunji Shin |
Identification of Threading Mixed Dislocations Having a Large Edge Component Burgers Vector by Polarized Light Observation (abstract) PRESENTER: Shunta Harada |
SiC Plasma Dicing for Future High Yield Die Singulation (abstract) PRESENTER: Ben Jones |
Superior Characteristics of Body Diode in DMOSFET Fabricated on 4H-SiC Bonded Substrate (abstract) PRESENTER: Yuta Higashi |
11:30-13:00 Session 3A: Quantum Sensing
Chairs:
Location: Room 305
11:30 | Optically Pumped Solid State Magnetometers for Planetary and Space Science: Inching closer to single-digit nanotesla sensitivities (abstract) PRESENTER: Hannes Kraus |
12:00 | Dephasing Times and Magnetic Field Sensitivity of the Silicon Vacancy in Isotopically-Purified 4H-SiC (abstract) PRESENTER: Samuel White |
12:20 | Simultaneous magnetic field and temperature sensing in SiC devices (abstract) PRESENTER: Takeshi Ohshima |
12:40 | Towards identification of single photon emitters and electro-optical characterization of defects at the 4H-SiC/a-SiO2 interface (abstract) PRESENTER: Adam Gali |
11:40-13:00 Session 3B: Sensors & Novel Applications
Chairs:
Location: Room 306
11:40 | Heavy ions radiation damage on silicon and silicon carbide detectors (abstract) PRESENTER: Francesco La Via |
12:00 | Influence of Gold Nanoparticle Distribution on the Performance of Self-powered Silicon Carbide Ultraviolet Photodetector (abstract) PRESENTER: Mustafa A. Yildirim |
12:20 | SiC CMOS Active Pixel Sensors with Embedded UV Photodiode (abstract) PRESENTER: Kazuma Tanigawa |
12:40 | Exploring intrinsic high-frequency limitations of electronic devices: The end of the road of Schottky rectification (abstract) PRESENTER: Heiko Weber |
14:30-16:00 Session 4A: Epitaxial Growth 1
Chairs:
Location: Room 305
14:30 | Review for Resonac’s SiC Epiwafer Development (abstract) |
15:00 | Silicon Carbide Epitaxial Growth Performance on 350um and 500um Thick 200mm Substrates (abstract) PRESENTER: Tom Kuhr |
15:20 | Basal Plane Dislocation Mitigation via Annealing and Growth Interrupts (abstract) PRESENTER: Rachael Myers-Ward |
15:40 | Defect density reduction in 4H-SiC (0001) epilayer via growth-interruption during buffer layer growth (abstract) PRESENTER: Shiv Kumar |
14:30-16:00 Session 4B: Advanced Features in SiC MOSFETs
Chairs:
Location: Room 306
14:30 | The Silicon Carbide FinFET – a milestone concept in power electronics (abstract) |
15:00 | ALD deposited SiO2 dielectric stack with engineered interface using in-situ Atomic Layer Annealing for high performance SiC MOSFET (abstract) PRESENTER: Andrii Voznyi |
15:20 | Optimizing 1.2 kV SiC Trench MOSFETs for Enhanced Performance and Manufacturing Efficiency (abstract) PRESENTER: Seung Yup Jang |
15:40 | Investigation of threshold voltage stability under high gate voltage stress in High-K SiC planar MOSFETs (abstract) PRESENTER: Marco Pocaterra |
16:15-17:30 Session 5: Posters 1
Location: Posters Floors 2 & 3
Process gas control for growth of high-resistant HPSI-SiC crystal (abstract) PRESENTER: Seung-June Lee |
A Novel Approach for the Volume Production of Wide-Bandgap Semiconductor (abstract) |
Evaluation of 4H SiC epitaxial CVD process on different 200 mm substrates for power device applications (abstract) PRESENTER: Andrea Severino |
200mm n-type SiC Uniform Low BPD in Their Whole Crystal Technology (abstract) PRESENTER: Ching Shan Lin |
Advanced diagnostics for rapid process development (abstract) PRESENTER: Slobodan Mitic |
Optimization of heat transfer design for high quality 4H-SiC ingot growth (abstract) PRESENTER: Seung-June Lee |
Study on growth of 8inch SiC substrate with ultra-low dislocation density (abstract) PRESENTER: Yan Peng |
Active planarization method from rough surface of 4º-off 4H-SiC (0001) controlled by step bunching and debunching mechanism using Dynamic AGE-ing® (abstract) PRESENTER: Kohei Toda |
Challenges in Investigating UIS Material-Based Failures & Yield Prediction in Absence of Robust 4H-SiC Epitaxial Defect Standards (abstract) PRESENTER: Jake Soto |
Low-temperature Photoluminescence characterization of 4H-SiC epilayers irradiated with H+ ions (abstract) PRESENTER: Melissa Lucia Scalisi |
Minority carrier lifetime mapping of stacking faults on photoluminescence maps from 4H-SiC epitaxial wafer by time-resolved photoluminescence (abstract) PRESENTER: Moonkyong Na |
Defects characterization and mitigation through the trench gate patterning process (abstract) PRESENTER: Remi Le Tiec |
The employment of laser light scattering as a full wafer inspection tool for controlling the quality variation in CMP-finished subsurface damage of SiC substrates (abstract) PRESENTER: Yuta Nakajima |
High Spatial Resolution Analysis of Dislocations in 4H-SiC Using Low Accelerating Voltage Scanning Electron Microscope (SEM)-Cathodoluminescence (CL) (abstract) PRESENTER: Shunsuke Asahina |
Hydrogen and point defect introduction into 4H-SiC by plasma treatment (abstract) PRESENTER: Tong Li |
Analysis of Deep-Level Defects in 4H-SiC MPS and PiN Diodes (abstract) PRESENTER: Tae-Hee Lee |
Densification & Single Side Polishing application for improvement of high-level wafer warpage in SiC substrate. (abstract) PRESENTER: Myeonggyun Kim |
Effects of sulfurization on the properties of 4H-SiC Schottky contacts (abstract) PRESENTER: Fabrizio Roccaforte |
Analysis of Ohmic contacts simultaneously formed on both n-type and p-type 4H-SiC (abstract) PRESENTER: Atsushi Shimbori |
An Ohmic Contact for SiC-based P-channel HFET (abstract) PRESENTER: Hiroyuki Sazawa |
C-Face Epitaxy for Enhanced SiC Device Performance: Insights from Schottky Barrier Diodes (abstract) PRESENTER: Roth Voo |
Qualitative study on laser backside ohmic contact formation of a SiC-Ni interface (abstract) |
A New Class of High-Voltage Si-SiC Hybrid Devices with Forced Carrier Extraction for Improved Switching Performances (abstract) PRESENTER: Dumitru-Gheorge Sdrulla |
Temperature and Gate Voltage Dependence of Rds,on in the 1.2kV SiC Planar and SBD-Embedded MOSFETs (abstract) PRESENTER: Xue-Fen Hu |
A Design of 1.2kV SiC DMOSFET with Locally Etched Poly-Si Gate to Improve Switching Characteristics (abstract) PRESENTER: Dusan Baek |
SiC Schottky-barrier diode without ion-implanted P-type regions (abstract) PRESENTER: Sima Dimitrijev |
Electric characteristics optimization of machine Learning method in 4H-SiC vertical diffusion MOSFETs (abstract) PRESENTER: Shih-Chiang Shen |
Advancing High-Temperature Performance in Wide-Bandgap Schottky Diodes with Mesa Structures (abstract) PRESENTER: Min-Yeong Kim |
Electrical characterization of HV (10 kV) Power 4H-SiC Bipolar Junction Transistor (abstract) PRESENTER: Dominique Planson |
Increasing relative manufacturing yield of in SiC MOSFET using advanced semiconductor substrate engineering (abstract) PRESENTER: Nicolo Piluso |
Predictive Doping and Thickness Analysis of a Multi-Wafer SiC Warm-Wall Epi Reactor for Improved Layer Cpks (abstract) PRESENTER: Muhammad Ali Johar |
Effect of temperature and substrate morphology on the deposition and growth of silicon carbide on a 4H-SiC substrate (abstract) PRESENTER: Kevin Kayang |
Impact of Post Deposition Annealing on SiO2/SiC Structures Formed by Plasma Nitridation of the SiC Surface (abstract) PRESENTER: Hiroki Fujimoto |
Late News: Liquid Metal Interconnects for SiC MOSFETs (abstract) PRESENTER: Nick Baker |
Tuesday, October 1st
View this program: with abstractssession overviewtalk overview
08:40-10:30 Session 7A: Bulk Growth 1
Chairs:
Location: Room 305
08:40 | Improvement of the yield during crystal growth of SiC by PVT by proper selection and design of hot zone isolation components (abstract) PRESENTER: Peter Wellmann |
09:10 | Rapid Growth of Bulk SiC crystals via Physical Vapor Transport Method : Challenges to Improvement in the crystal qualities under rapid growth (abstract) PRESENTER: Seong-Min Jeong |
09:30 | Crystal Quality Evaluation of 6-inch and 8-inch SiC Growth in Resistive Furnaces: Defect Mapping and Characterization (abstract) PRESENTER: René Hammer |
09:50 | Study on effect of interfacial pore between seed and graphite holder for physical vapor transport growth of 4H-SiC crystal (abstract) PRESENTER: Daisuke Tahara |
10:10 | TaC-based protective coating systems adapted on graphite materials with different thermal expansion for the use in SiC PVT crystal growth (abstract) PRESENTER: Kevin Schuck-Buehner |
08:40-10:30 Session 7B: MOSFET Channel Optimization
Chairs:
Location: Room 306
08:40 | Mobility enhancement in SiC n- and p-channel MOSFETs (abstract) PRESENTER: Mitsuaki Kaneko |
09:10 | Anisotropy variation in MOS channel mobility among 4H-SiC nonpolar and semipolar faces (abstract) PRESENTER: Hirohisa Hirai |
09:30 | Characterization of interface trap and mobility degradation in SiC MOS devices using gated Hall measurements (abstract) PRESENTER: Suman Das |
09:50 | Dynamic vs. Quasi-stationary C-V Characterization of MOS Capacitors (abstract) PRESENTER: Michel Nagel |
10:10 | Impact of Positive and Negative High Voltage Gate Stress on Channel Degradation in SiC MOSFETs (abstract) PRESENTER: Shane Stein |
11:00-12:30 Session 8A: Engineered Substrates
Chairs:
Location: Room 305
11:00 | SmartSiC™ 150 & 200mm engineered substrate: enabling SiC power devices with improved performances and reliability (abstract) PRESENTER: Eric Guiot |
11:30 | Improvement over temperature of the substrate resistance contribution on a SiC diode by using SiC engineered substrates (abstract) PRESENTER: Gabriele Bellocchi |
11:50 | High-temperature adhesive bonding of 4H-SiC substrates (abstract) PRESENTER: Priyank Parmar |
12:10 | Study on epi performance of engineered 150 mm and 200 mm SiC substrates in a multi-wafer batch reactor (abstract) PRESENTER: Philip Hens |
11:00-12:30 Session 8B: MOS Interfaces
Chairs:
Sang-Mo Koo and Jun Zeng
Location: Room 306
11:00 | Doping-dependent fixed charges in SiC MOSFETs (abstract) PRESENTER: Kyota Mikami |
11:30 | Investigation of Poly-Si gated, Al2O3-based high-k Dielectrics on 4H-SiC (abstract) PRESENTER: Johannes Ziegler |
11:50 | Investigation of Interface and Reliability of 3C- and 4H-SiC MOS Structures through Gate Dielectric Stacking and Post-Deposition Annealing (abstract) PRESENTER: Mustafa Akif Yildirim |
12:10 | 4H-SiC Vertical Trench Power MOSFET Fabricated by Oxidation-Minimizing Process (abstract) PRESENTER: Hidemoto Tomita |
14:00-16:00 Session 9A: Characterization I (Rm 305)
Chairs:
Location: Room 305
14:00 | Atomistic defect modeling in SiC for crystal growth optimization (abstract) PRESENTER: Lorenz Romaner |
14:20 | Analysis of Trap Centers Generated by Hydrogen Implantation in 4H-SiC Bonded Substrates (abstract) PRESENTER: Hidetsugu Uchida |
14:40 | Study on conversion of survived BPDs in epitaxial layer to TEDs (abstract) PRESENTER: Kazumi Takano |
15:00 | Relationship between contrast formation in the mirror electron images and the distribution of crystal defects in polishing damage introduced on the surface of 4H-SiC wafers (abstract) PRESENTER: Hideki Sako |
15:20 | Role of Point Defects in Suppressing Stacking Fault Expansion through Helium and Proton Implantation in SiC Epitaxial Layer (abstract) PRESENTER: Shunta Harada |
15:40 | Polarization superimposed phase contrast microscope inspection of dislocations in SiC epitaxial layer (abstract) PRESENTER: Ryo Hattori |
14:00-16:00 Session 9B: High Temperature Operation & Radiation Effects
Chairs:
Location: Room 306
14:00 | Design and Simulation of Greatly Improved Future Generation 4H-SiC JFET-R Integrated Circuits for Prolonged 500 °C Operation (abstract) PRESENTER: Christina Adams |
14:20 | Device Performance and Reliability of SiC CMOS up to 400 ̊C (abstract) PRESENTER: Emran Ashik |
14:40 | Analysis of Latent Gate Oxide Damage in Heavy-Ion Irradiated High-Voltage SiC Power MOSFETs (abstract) PRESENTER: Arijit Sengupta |
15:00 | Improvement of Single Event Leakage Current Tolerance in 4H-SiC Trench MOSFET (abstract) PRESENTER: Eiji Kagoshima |
15:20 | SiC in space: potential application survey (abstract) |
15:40 | Demonstration of Structural Effects on SEB Tolerance in Trench Gate SiC-MOSFETs under Heavy-Ion Irradiation (abstract) PRESENTER: Misa Takahashi |
16:30-18:30 Session 10: Posters 2
Location: Exhibit Hall ABC
Monolithic fabrication of 4H-SiC micromechanical devices by electrochemical etching and characterization of vibrational modes (abstract) PRESENTER: André Hochreiter |
SiC Avalanche Photodiodes—Crystal Orientation and Spatial Uniformity (abstract) PRESENTER: Daniel Habersat |
Towards a scalable, integrated real-world quantum magnetometer based on proprietary 4H silicon carbide technology (abstract) PRESENTER: Peter A. Stuermer |
Integrated Photonic with Divacancy Defects in 4H-SiC-on-Insulator Platform (abstract) PRESENTER: Shanying Cui |
Technology development for nano-pillars fabrication in silicon carbide to enhance light collection from color centers (abstract) PRESENTER: Enora Vuillermet |
Scalar Atomic Defect-Based Solid-State Self-calibrating Magnetometer (3SM) for Space Plasma Analysis (abstract) PRESENTER: Daniel Hart |
Latching current limiter for high-power distribution in space enabled by SiC N-MOSFET (abstract) |
Filling-design effect of powder source in the crucible on SiC single-crystal growth (abstract) PRESENTER: Min Gyu Kang |
A study of epitaxial growth on 4H-SiC substrates treated by plasma polish dry etch (PPDE) process (abstract) PRESENTER: Tawhid Rana |
Improved thermal uniformity and power efficiency of graphite heating devices coated with TaC (abstract) PRESENTER: Bowen Dong |
Development and scale-up of 200mm 4H SiC crystals (abstract) PRESENTER: Taehee Kim |
Graphite an Enabler for Single Crystal SiC Growth (abstract) PRESENTER: Joseph Abrahamson |
The application of dynamical thermal annealing processes after mechanical slicing as an integrated contactless SiC wafering method to control crystal defects (abstract) PRESENTER: Kohei Toda |
Optimization of SiC growth processes by using insights of inductive SiC inspection (abstract) PRESENTER: Michael Hofmann |
Factors to determine resistance characteristics of semi-insulating SiC single crystal (abstract) PRESENTER: Woo Yeon Kim |
Defect optimization by controlling etching, seeding and ramping on a planetary batch reactor (abstract) PRESENTER: Jürgen Erlekampf |
Integrated Approach to SiC Crystal Growth: Multiphysics Modeling and Chemistry Assessment in PVT Furnaces (abstract) PRESENTER: Zaher Ramadan |
Mechanical Behavior of CVD-grown Tantalum Carbide (TaC) Coatings on Graphite Substrates (abstract) PRESENTER: Yvonne Dieudonné |
Nanoscale infrared spectroscopic characterization of threading dislocations in SiC (abstract) PRESENTER: Scott Criswell |
Study of in-grown micropipes in 200 mm 4H-SiC (0001) epitaxial substrate (abstract) PRESENTER: An Min Amanda Lee |
Non-contact Full wafer Imaging of Electrically Active Defects in 4H-SiC Epi with Comparison to End of Line Electrical Device Data (abstract) PRESENTER: Marshall Wilson |
Coherency between epitaxial defectivity, surface voltage, photoluminescence mapping and electrical wafer sorting for 200mm SiC wafers. (abstract) PRESENTER: Jimmy Thörnberg |
Numerical analysis of correlation between UV irradiation and current injection on bipolar degradation in PiN diodes (abstract) PRESENTER: Yasuyuki Igarashi |
Observation of typical triangular Frank-type stacking faults in 4H-SiC epitaxial layer (abstract) PRESENTER: Moonkyong Na |
Silicon Carbide wafer edge, bevel and apex defect characterization with inline SEMVision® G3MAXFIB (abstract) PRESENTER: Annalisa Cannizzaro |
DUV laser-based defect inspection of single-crystal 4H-SiC and SmartSiC engineered substrates for high volume manufacturing (abstract) PRESENTER: Enrica Cela |
Nanoscale infrared polytype layer analysis and charge carrier profiling (abstract) PRESENTER: Dario Siebenkotten |
Characterization of Void Defects in PVT-Grown 4H-SiC Crystals (abstract) PRESENTER: Yafei Liu |
Controlled Spalling of Single Crystal 4H-SiC Bulk Substrates (abstract) PRESENTER: Connor Horn |
Co-optimization of APF-based advanced mask deposition, etch and metrology processing for high-performance SiC devices (abstract) PRESENTER: Ludovico Megalini |
A New Era of 8" Silicon-Carbide Wafering (abstract) PRESENTER: Malte Mueller |
Examining Nitrogen Doping Effects on MOCVD-Epitaxially Grown SiC Films on 4H-SiC Substrates (abstract) PRESENTER: Min Jae Kang |
Effect of intervening layer insertion on Φb reduction in TiN Schottky (abstract) PRESENTER: Shigeaki Takagi |
Monitoring of dose, temperature, and energy-dependent damage in Al implanted 4H-SiC by UV photo-modulated reflectance measurement (abstract) PRESENTER: Ha Bin Jeong |
Vth behavior by different barrier metals at positive bias HTGB & negative bias HTGBx (abstract) PRESENTER: Sanghong Park |
Sonic Lift-off of 50μm-thick layers to Replace Backgrinding and Enable 4H-SiC Substrate Reuse (abstract) PRESENTER: Pablo Guimerá Coll |
Impact of Silicon Nitride Stress on Defects Generation in 4H-SiC and the Effect of Sacrificial Oxidation on Defects Reduction (abstract) PRESENTER: Kai-Wen Hsu |
Impacts of thermal oxidation and forming gas annealing on surface morphology of SiC(0001) (abstract) PRESENTER: Shinji Kamihata |
Superjunction implementations within a 4H-SiC double trench MOSFET structure (abstract) PRESENTER: Peter Gammon |
Effect of Chip Size on Reverse Recovery of SiC MOSFETs with Edge Termination (abstract) PRESENTER: Yeonjun Kim |
Spin-dependent-charge-pumping spectroscopy on p-channel 4H-SiC MOSFETs (abstract) PRESENTER: Sosuke Horiuchi |
Displacement Damage Effect of Proton Irradiation on Vertical SiC and β-Ga2O3 based Schottky Barrier Diodes (SBDs) (abstract) PRESENTER: Jae Hwa Seo |
Novel SiC MOSFET Edge-Termination Structure for Electric Field Relaxation Using an Oxide Film Along the Trench Surface (abstract) PRESENTER: Yoshitaka Kimura |
Effect of channel width and length on the mobility of 4H-SiC lateral MOSFETs using ion-implanted n- and p-base regions (abstract) PRESENTER: Jeong Hyun Moon |
Temperature-Dependent Hole Scattering in p-Channel 4H-SiC MOSFETs with Different Channel Lengths (abstract) PRESENTER: Young-Hun Cho |
Influence of Oxidation Time and Method on 4H-SiC MOS Capacitor Characteristics (abstract) PRESENTER: Youngjae Park |
The investigation of effective thermal oxidation to SiC MOSFET gate oxide quality improvement (abstract) PRESENTER: Youngbin Im |
Coupling TCAD with Junction DLTS to extract capture properties of minority carrier traps: the Shallow Boron center in N-type 4H-SiC (abstract) PRESENTER: Orazio Samperi |
Electrical Characteristics of N-Channel 4H-SiC MOSFET Under Positive-Bias Stress at 300℃ Ambient (abstract) PRESENTER: Vuong Van Cuong |
Epitaxial SiC Development for Young's Modulus Improvement (abstract) PRESENTER: Brenda Vanmil |
The Doping Concentration Study of 4H-SiC Epitaxy with Nitrogen and Ammonia/Hydrogen Mixed Gas as Dopant (abstract) PRESENTER: Yuebin Han |
NZFMR Magnetometry up to 500C Using SiC devices (abstract) PRESENTER: Fabrizio Sgrignuoli |
Evaluation of interface state density in ultrathin SiO2/SiC MOS structures utilizing self-assembled monolayers (abstract) PRESENTER: Takuji Hosoi |
2.0 kV 4H-SiC TMBS Embedded UMOSFET (abstract) PRESENTER: Jia-Wei Hu |
Impact of Gate Switching Instability in SiC MOSFETs Application Performance Degradation During Hard Switching Conversion (abstract) PRESENTER: Andrea Piccioni |
TDDB and HTGB Study of SiC MOSFET with Excessive Channel Leakage (abstract) PRESENTER: Shuoben Hou |
Wednesday, October 2nd
View this program: with abstractssession overviewtalk overview
08:40-10:30 Session 11A: Characterization II
Chairs:
Location: Room 305
08:40 | Unveiling border trap energetics in a SiO2-SiC system using capacitance based optical excitation spectroscopy (abstract) PRESENTER: Piyush Kumar |
09:10 | Carbon-related interface defects in p-channel 4H-SiC MOSFETs (abstract) PRESENTER: Bunta Shimabukuro |
09:30 | Signal inversion in charge pumping electrically-detected magnetic resonance of 4H-SiC MOSFETs (abstract) PRESENTER: Ilias Vandevenne |
09:50 | Photoelastic measurement of residual stress in 4H-SiC substrates for evaluation of crystal growth and wafering process (abstract) PRESENTER: Paul Wimmer |
10:10 | Electrical detection of Magnetic Resonance on a Chip (EDMRoC): A low-cost and sensitive characterization tool for defects in SiC MOSFETs (abstract) PRESENTER: Sofie Cambré |
08:40-10:30 Session 11B: Superjunction & High Voltage Devices
Chairs:
Location: Room 306
08:40 | Deep Implanted SiC Super-Junction Technology (abstract) PRESENTER: Reza Ghandi |
09:10 | Cost-Effective Design and Optimization of a 3300-V Semi Superjunction 4H SiC MOSFET Device (abstract) PRESENTER: Kyrylo Melnyk |
09:30 | Economic Feasibility Analysis of Vertical High-Voltage 4H-SiC Superjunction MOSFETs Compared to Conventional Counterparts (abstract) PRESENTER: Mohamed Torky |
09:50 | Impact of transition from full- to semi-superjunction structure on the performance limit of 4H-SiC devices (abstract) PRESENTER: Daisuke Iizasa |
10:10 | High Current Pulse Power Operation of 12 kV SiC Thyristors (abstract) PRESENTER: Koji Nakayama |
11:00-12:30 Session 12B: Stress & Threshold Voltage Instabilities
Chairs:
Location: Room 306
11:00 | Threshold voltage drift mechanism in SiC MOSFETs by photon-assisted electron injection under bipolar AC gate stress (abstract) PRESENTER: Hiroshi Yano |
11:30 | Insight into the mobility-limiting factors of SiC MOSFETs: the impact of gate bias stress (abstract) PRESENTER: Takuma Kobayashi |
11:50 | Ultra-fast bias temperature instability and charge pumping studies of SiC trench MOSFETs with varying trench orientations (abstract) PRESENTER: Peter Moens |
12:10 | Achieving Low Dit (~5×1010eV-1cm-2), Competitive JG (~ 5×10-10 A cm-2) Performance and Enhanced Post-Stress Flatband Voltage Stability Using Deposited Oxide (abstract) PRESENTER: Umesh Chand |
11:10-12:30 Session 12A: Epitaxial Growth 2
Chairs:
Location: Room 305
11:10 | An approach on the void-free refill of 4H-SiC trench by CVD (abstract) PRESENTER: Shiyang Ji |
11:30 | Controlling 4H-SiC Trench Refill Epitaxy for Superjunction Power Devices with Supersaturated Chlorinated Chemistry (abstract) PRESENTER: Vishal Shah |
11:50 | Lateral epitaxial CVD growth of 4H-SiC (abstract) PRESENTER: Ul Hassan |
12:10 | Nearly Defect-Free Epitaxy on 150 mm C-Face SiC Substrates (abstract) PRESENTER: Nguyen Xuan Sang |
14:00-16:00 Session 13B: Contacts
Chairs:
Location: Room 306
14:00 | Formation of Pt ohmic contacts on p-type SiC with low contact resistivity by 600°C-annealing process (abstract) PRESENTER: Kotaro Kuwahara |
14:20 | A simplified method for extracting contact resistivity using the circular transmission line model (abstract) PRESENTER: Jae-Hyung Park |
14:40 | Evolution of the electrical and microstructural properties of Mo/4H-SiC contact with the annealing temperature (abstract) PRESENTER: Marilena Vivona |
15:00 | Advantages of backside metal contact resistance on 4H-SiC bonded substrates for power devices (abstract) PRESENTER: Motoki Kobayashi |
15:20 | Indium-Tin-Oxide (ITO) Interlayer-assisted Ohmic Contacts on N-type 4H-SiC with Low Specific Contact Resistance (abstract) PRESENTER: Hannan Yeo |
15:40 | Formation of Ti-based ohmic contacts on n-type SiC with ρC= 6*10^{-8} Ωcm^2 (abstract) PRESENTER: Keishiro Maeda |
14:10-16:00 Session 13A: Extended Defects I
Chairs:
Location: Room 305
14:10 | X-ray Topography Characterization of SiC Crystals aided by Ray Tracing Simulations (abstract) PRESENTER: Balaji Raghothamachar |
14:40 | Using Convolutional Neural Network to Map Defects in SiC (abstract) PRESENTER: James Gallagher |
15:00 | Punching of Prismatic Dislocation Loops from Inclusions in 4H-SiC Wafers (abstract) PRESENTER: Qianyu Cheng |
15:20 | Abnormal carrot defect and its buried prismatic stacking fault structure in 4H-SiC epitaxial layer (abstract) PRESENTER: Soon-Ku Hong |
15:40 | New insights into the occurrence of prismatic slip during PVT growth of SiC crystals (abstract) PRESENTER: Shanshan Hu |
16:30-18:30 Session 14: Posters 3
Location: Exhibit Hall ABC
Polarization control of SiO2/SiC interfacial single-photon sources by oxygen pressure during thermal oxidation (abstract) PRESENTER: Rinku Oyama |
Selective Initialization Mechanism of Silicon Vacancy Spin Qubits with spin S=3/2 in Silicon Carbide (abstract) PRESENTER: Seung-Jae Hwang |
Impurity-vacancy complexes in 4H-SiC: stability and properties (abstract) PRESENTER: Takuma Kobayashi |
Suppression of luminescent spots at SiO_2/SiC interfaces by thermal oxidation at low oxygen partial pressure (abstract) PRESENTER: Kentaro Onishi |
Near Field Spectroscopy of Silicon Carbide Nanosheets for Novel Application (abstract) PRESENTER: Nishan Shrestha |
Dynamic characterization and robustness of SiC MOSFETs based on SmartSiCTM engineered substrates (abstract) PRESENTER: Mohamed Alaluss |
Extrinsic Gate Reliability of SiC MOSFETs (abstract) PRESENTER: Rishi Kupper |
Optimization of Gate Oxide Screening Technology for Commercial SiC discrete MOSFETs and Power Modules (abstract) |
On the Relationship of Processing Parameters and Epitaxial Defects to Extrinsic Failure in SiC Gate Oxide (abstract) PRESENTER: Holger Schlichting |
Switching Characteristics of Gate Driver Circuit Based on 4H-SiC MOSFETs at 500℃ (abstract) PRESENTER: Vuong Van Cuong |
Unclamped Inductive Switching in SiC MOSFETs and Diodes: Implications for Standards, Testing, and Screening (abstract) PRESENTER: Davood Momeni |
Life prediction of SiC-MOSFET by accelerated test using anode hole injection correction (abstract) PRESENTER: Koichi Endo |
Prospects and Challenges for SiC Power Devices in MMC-VSC Applications (abstract) PRESENTER: Saeed Jahdi |
Investigation of Interface Traps Distribution using a Temperature Dependent Threshold Voltage Shift Method in Commercial 4H-SiC Power MOSFETs (abstract) PRESENTER: Monikuntala Bhattacharya |
High-quality SiC crystal growth by the control of cooldown rate at cooling stage (abstract) PRESENTER: Lee Chae-Young |
High Removal Rate Silicon Carbide (SiC) Slurry (abstract) PRESENTER: Sridevi Alety |
Streamlining SiC Boule Fabrication - Optimized Wafer Ready Material (abstract) PRESENTER: Jeffrey Gum |
Performance Enhancement of Cu2O/SiC Heterostructured Diodes (abstract) PRESENTER: Hyun-Woo Lee |
Inline Methodology for Rapid Characterization of Carrier Mobility in SiC Drift Layer and Wafer Mapping of 200 mm 4H-SiC Wafers (abstract) PRESENTER: Wendong Song |
Investigation of BaTiO3/4H-SiC metal-ferroelectric-semiconductor structures (abstract) PRESENTER: Ji-Soo Choi |
Recent Advancement in Noncontact Wafer Level Electrical Characterization for WBG Technologies (abstract) PRESENTER: Marshall Wilson |
Kinematical parameters determining the nitrogen doping uniformity during physical vapor transport growth of 4H-SiC crystals (abstract) PRESENTER: Yuta Inoue |
Progress in etching methods of SiC wafer (abstract) PRESENTER: Jungmin Lee |
Closely spaced midgap levels in 4H-SiC bandgap revealed by Laplace-transform photoinduced transient Spectroscopy (abstract) PRESENTER: Kinga Kosciewicz |
How to simulate bipolar degradation by UV irradiation with high accuracy (abstract) PRESENTER: Yasuyuki Igarashi |
Molecular Dynamics Simulation Approach to H2 Etching Process on SiC (abstract) PRESENTER: Hidenori Saeki |
Automatic etch pit detection and characterization in KOH etch images of 4H-SiC using deep learning (abstract) PRESENTER: Georg Holub |
All-Optical Volumetric Imaging of Killer Defects in a SiC Epilayer (abstract) PRESENTER: Torben Lennart Purz |
Electrical characterization of SiO2/4H-SiC interfaces with an ion implanted oxide (abstract) PRESENTER: Giovanni Alfieri |
Dependence of epi defects on surface preparation by plasma techniques. (abstract) PRESENTER: Zareena Hassanbee |
Study of SiC trench etching characteristics for different crystal planes (abstract) PRESENTER: Akhil Ranjan |
Dependence of Gate Oxide Thickness on High-Temperature Characteristics of 4H-SiC MOSFET (abstract) PRESENTER: Vuong Van Cuong |
Engineered bilayer high-κ gate dielectric stacks for ideal operation of high-performance SiC power MOSFETs (abstract) PRESENTER: Sami Bolat |
Gate Oxide Performance and Reliability on SmartSiC™ Wafers and the Influence of RTA processing on Gate Oxide Lifetime (abstract) PRESENTER: Tom Becker |
Formation of structured low-ohmic p-type contacts on Al-implanted 4H-SiC by laser annealing (abstract) PRESENTER: Carsten Hellinger |
Analysis of mechanical properties of 4H-SiC 6 inch wafers by nanoindentation test (abstract) PRESENTER: Brunella Cafra |
Grind performance improvement study for SiC (abstract) PRESENTER: Byungyoon An |
Analysis of SiO2 Mask Shape Effect on SiC Trench Deformation in Biased SF6/O2 Inductively Coupled Plasma (abstract) PRESENTER: Daria Zimina |
Rapid thermal anneal with conductive heating for SiC wafers processing (abstract) PRESENTER: Xavier Pages |
A Novel Design of SiC High-Voltage Lateral PiN Diode for IC Application (abstract) PRESENTER: Xiaofan Ma |
Optimizing Short Channel Designs in 1700 V 4H-SiC VDMOSFET (abstract) PRESENTER: Servin Rathi |
Evaluation of switching performances and short circuit capability of a 1.2 kV SiC GAA MOSFET through TCAD simulations (abstract) PRESENTER: Luca Maresca |
DFT analysis on the electronic structure of 4H-SiC/SiO2 after NO annealing (abstract) PRESENTER: Tomoya Ono |
Design parameters impact on electrical characteristics of 4H-SiC thyristors with etched junction termination extension (abstract) PRESENTER: Kamil Kotra |
Out-of-SOA performance of 3.3 kV SiC MOSFETs: Comparison between Planar and Quasi-Planar Trench (abstract) PRESENTER: Alessandro Borghese |
Trench shape dependence of stress distribution in 4H-SiC trench MOSFET test structures by Scanning Near-field Optical Raman Microscope (abstract) PRESENTER: Tatsuhiro Nagasaka |
Impact of Single-Step Deep P-Body Implant on 1.2 kV 4H-SiC MOSFET (abstract) PRESENTER: Abdul Yeo Hannan |
Static Analysis of High Voltage Vertical Silicon & SiC NPN BJTs (abstract) PRESENTER: Saeed Jahdi |
Fast high current sensing SMD resistor network layout for low inductance insertion (abstract) PRESENTER: Antxon Arrizabalaga |
Research Progress on the SiC Single Crystal via Top-Seeded Solution Growth Method and Its Key Issues (abstract) PRESENTER: Peng Gu |
Innovative SiC coating for protection graphite reactor components in SiC semiconductor processing (abstract) PRESENTER: Matthias Trempa |
High mobility SiC MOSFETs using an oxidation-minimizing process (abstract) PRESENTER: Koushik Ramadoss |
1200 V 4H-SiC VDMOSFET Having >2.5x On-Current Improvement (abstract) PRESENTER: Yuniarto Widjaja |
Thursday, October 3rd
View this program: with abstractssession overviewtalk overview
08:40-10:30 Session 15A: Extended Defects II (Stacking Faults)
Chairs:
Location: Room 305
08:40 | Formation mechanism of basal plane dislocations in 150 mm-diameter SiC wafers with thick epitaxial layers (abstract) PRESENTER: Fumihiro Fujie |
09:10 | Investigation of BPD Faulting in Engineered vs Monocrystalline SiC Substrates Under Ultra-High Carrier Injection for Pulsed Power Application (abstract) PRESENTER: Nadeemullah Mahadik |
09:30 | Formation Mechanism and Complex Faulting Behavior of a BPD Loop in 180 µm Thick 4H-SiC Epitaxial layer (abstract) PRESENTER: Zeyu Chen |
09:50 | Dynamics of stacking fault expansion in H+ implanted SiC-MOSFETs investigated by photoluminescence spectroscopy (abstract) PRESENTER: Kazuya Ishibashi |
10:10 | Demonstration of Suppressing 1SSF Expansion Using Energy Filtered Ion Implantation (abstract) PRESENTER: Hitesh Jayaprakash |
08:40-10:30 Session 15B: Novel Device Architectures
Chairs:
Location: Room 306
08:40 | Suppression of Short-Channel Effects by Self-Aligned Process for SiC UMOSFETs with Channel Length of under 0.3 μm (abstract) PRESENTER: Shinichi Kimoto |
09:10 | Investigation of Advanced Hexagonal Layouts for 650 V SiC MOSFETs (abstract) PRESENTER: Jaehoon Park |
09:30 | A Novel 'Ladder' Design for Improved Channel Density for 1.2kV 4H-SiC MOSFETs (abstract) PRESENTER: Skylar Deboer |
09:50 | SiC MOSFETs C-V capacitance curves with negative biased Drain (abstract) PRESENTER: Ilaria Matacena |
10:10 | On the Characterization of 4H-SiC PiN and JFETs for their USE in High-Voltage Bidirectional Power Devices (abstract) PRESENTER: Arne Benjamin Renz |
11:00-12:30 Session 16B: Radiation Effects & Superjunction
Chairs:
Location: Room 306
11:00 | Heavy-ion irradiation effects in 4H-SiC unipolar devices (abstract) PRESENTER: Corinna Martinella |
11:30 | Impact of electron irradiation on SiC power MOSFET performance (abstract) PRESENTER: Kotaro Matsuki |
11:50 | Effects of Proton Irradiation Before Device Fabrication on the Switching Characteristics of 3.3kV SiC MOSFETs (abstract) PRESENTER: Kumiko Konishi |
12:10 | Annealing 4H-SiC Trenches for Superjunction Technology (abstract) PRESENTER: Vishal Shah |
11:10-12:30 Session 16A: Quantum Centers & Characterization
Chairs:
Location: Room 305
11:10 | Control over the density of single photon emitters at SiO_2/SiC interfaces: CO_2 vs. Ar annealing (abstract) PRESENTER: Takato Nakanuma |
11:30 | Investigation of the Stark Effect of TS and E color centers on a-face 4H-SiC (abstract) PRESENTER: Johannes Lehmeyer |
11:50 | Evolution of photoluminescence and optically detected magnetic resonance spectra of divacancy defects in 4H-SiC from cryogenic to room temperatures (abstract) PRESENTER: Ivan G. Ivanov |
12:10 | Investigation of oxygen-related defects in 4H-SiC from ab initio calculations (abstract) PRESENTER: Sosuke Iwamoto |
14:00-16:00 Session 17B: Device Characterization & Defect Impacts
Chairs:
Location: Room 306
14:00 | Temperature Dependence of 1200V-10A SiC Power Diodes: Impact of Design and Substrate on Electrical Performance (abstract) PRESENTER: Ahmad Abbas |
14:20 | Exploring the Influence of Implant Profile and Device Design on Basal Plane Dislocation Generation in 1.2kV 4H-SiC Power MOSFETs (abstract) PRESENTER: Stephen Mancini |
14:40 | Three level stress pulses to investigate gate switching instability (abstract) PRESENTER: Dick Scholten |
15:00 | Investigation on effect of electrical characteristics of proton implanted 4H-SiC MOSFET (abstract) PRESENTER: Naoki Shikama |
15:20 | Matching physical and electrical measurements (OBIC) to simulation (FEM) on high voltage bipolar diodes (abstract) PRESENTER: Dominique Planson |
15:40 | Using in-situ nanoprobing in the scanning electron microscope to visualize the local potential on a biased SiC p-n junction (abstract) PRESENTER: Maximilian Moser |
14:10-16:00 Session 17A: Bulk Growth 2
Chairs:
Location: Room 305
14:10 | 8-inch thick SiC crystals grown by solution growth method combined with digital twin (abstract) PRESENTER: Toru Ujihara |
14:40 | Numerical Simulation Study on Different Scales to Suppress Solvent Inclusion Defects in SiC Solution Crystal Growth (abstract) PRESENTER: Huiqin Zhou |
15:00 | Development of a 200 mm-Diameter 4H-SiC Crystal Using the HTCVD Method Enhanced by Process Informatics (abstract) PRESENTER: Daisuke Uematsu |
15:20 | A novel method to grow 4H-SiC single crystals with low BPD densities on multiple substrates: Grown crystals’ properties and their controlling factors (abstract) PRESENTER: Jun Yoshikawa |
15:40 | ML-based Surrogate Model for Temperature Prediction and Efficient Parameter Calibration of PVT Simulations (abstract) PRESENTER: Lorenz Taucher |
16:30-18:30 Session 18: Posters 4
Location: Exhibit Hall ABC
Investigation on the CTE matching of graphite substrates and TaC coating (abstract) PRESENTER: Bowen Dong |
Thick Semi Insulating 4H-SiC Layer Exfoliation for Non-Epitaxial Engineered Substrates (abstract) PRESENTER: Hitesh Jayaprakash |
3C-SiC on Si substrates by Si and C multilayers transformation (abstract) PRESENTER: Joerg Pezoldt |
Development of a novel warpage control method for epi-ready 4H-SiC wafers by depositing homoepitaxial layers on both Si- and C-faces (abstract) PRESENTER: Daichi Dojima |
Submicron Diamond Slurry for Polishing Silicon Carbide Wafers (abstract) PRESENTER: Timothy Dumm |
Partial dislocation-induced surface irregularities observed on 4H-SiC homoepitaxial layers (abstract) PRESENTER: Koki Kitahara |
Highly spatially resolved photoluminescence characterization of the grown crystal/seed interface of physical vapor transport grown 4H-SiC crystals (abstract) PRESENTER: Yuzo Takeda |
Nitrogen Dopant Incorporation into epitaxial 4H-SiC: Influence of Chemical Vapor Deposition Growth Parameters and Materials (abstract) PRESENTER: Alexander Schrader |
A novel method to grow 4H-SiC single crystals with low BPD densities on multiple substrates: Behaviors of BPDs and other defects (abstract) PRESENTER: Yuki Urata |
Modeling Study of the Effect of Process Parameters and Wall Coatings on Doping Uniformity in SiC Epitaxy (abstract) PRESENTER: Alex Galyukov |
Influence of Deposition Techniques on the Electrical properties and Deep level Defect of Ga2O3/SiC heterojunction diode (abstract) PRESENTER: Seung-Hwan Chung |
Homoepitaxy of 4H-SiC on a-plane substrates (abstract) PRESENTER: Robin Karhu |
Clustering tendencies of C atoms in SiO2 matrix with different O-containing conditions: molecular dynamics study with a universal neural network potential (abstract) PRESENTER: Hiroki Sakakima |
Determining Compensation of Implanted Aluminum Dopants in 4H-SiC by Simultaneous Fitting of Charge Carrier Concentration and Mobility (abstract) PRESENTER: Julian Kauth |
Investigation on Bipolar Degradation caused by Micropipe in 3.3kV SiC-MOSFET (abstract) PRESENTER: Hiroki Niwa |
High Temperature Evolution of Thin Films Confined Between Two Silicon Carbide Substrates (abstract) PRESENTER: Maëlle Le Cunff |
Doping dependent electronic and kinetic properties of dislocations in 4H silicon carbide (abstract) |
Novel Catalyst-Referred Etching Technology for Preparing Epi-Ready Silicon Carbide Substrates (abstract) PRESENTER: Ara Philipossian |
Threading Dislocation Behavior in the Facet Region of PVT-Grown 4H-SiC Crystals (abstract) PRESENTER: Yafei Liu |
Analysis of Lattice Damage in 4H-SiC Epiwafers Implanted with High Energy Al Ions with Silicon Energy-Filter for Ion Implantation (abstract) PRESENTER: Zeyu Chen |
A preliminary investigation of defects in GaN pn junction diodes using electrically detected magnetic resonance and near zero field magnetoresistance spectroscopy (abstract) PRESENTER: Michael Elko |
Carbon vacancy in commercial junction barrier Schottky diodes (abstract) PRESENTER: Francis Ling |
DFT calculations on the surface termination of 4H-SiC {10-10} and {11-20} during photoelectrochemical pore formation (abstract) PRESENTER: Tingqiang Yang |
Proton implantation into substrate and stacking faults in epitaxial layers (abstract) PRESENTER: Masashi Kato |
TCAD Model for Thermal Oxidation of 4H-SiC (abstract) PRESENTER: Tamara Fidler |
Fabrication of 3.3 kV SiC PiN diodes with step-ring-assisted junction termination extension for a reliable blocking capability (abstract) PRESENTER: Sangyeob Kim |
Damage Evaluation and Elemental Analysis of SiC Wafers Processed by Water Jet Guided Laser (abstract) PRESENTER: Shuzo Masui |
BCl3 Plasma Treatment for Enhanced Ohmic Contact Performance to P-type 4H-SiC (abstract) PRESENTER: Hannan Yeo |
ITO/4H-SiC Schottky contacts for UV applications (abstract) PRESENTER: Razvan Pascu |
Argon plasma treatment of 4H-SiC surface before nickel ohmic contacts formation by UV laser annealing (abstract) PRESENTER: Jean-François Michaud |
Impact of interfacial SiO2 layer thickness on the electrical performance of SiO2/High-k stacks on SiC (abstract) PRESENTER: Sandra Krause |
Understanding of the impact of Carrot-like defects embedded in the 4H-SiC power MOSFET structure: a route for an effective device qualification (abstract) PRESENTER: Patrick Fiorenza |
Single-Event-Burnout in 1.2kV 4H-SiC Lateral RESURF Power MOSFET (abstract) PRESENTER: Zhaowen He |
Robust switching performance of 1.2 kV SiC MOSFETs using internal SBDs integration (abstract) PRESENTER: Gyuhyeok Kang |
Characterization of SiC trenches using innovative 3D CDSEM (abstract) PRESENTER: Shunit Petachia Halely |
Instability in Thermal Impedance Characterization of SiC MOSFETs: The Impact of Reverse Conducting Channel Leakage on Body Diode Temperature-Sensitive Parameters Method (abstract) PRESENTER: Kuo-Ting Chu |
SiC for sensing in harsh environments: status, new efforts. (abstract) PRESENTER: Marc Portail |
The 3rd Quadrant Operation of 4th Generation SiC MOSFETs: Transients & Reverse Recovery (abstract) PRESENTER: Saeed Jahdi |
Progress Towards 4H-SiC Low Gain Avalanche Detectors (LGADs) (abstract) PRESENTER: Ben Sekely |
A Novel all-SiC Neural Interface: In-vivo Performance (abstract) PRESENTER: Matthew Melton |
Temperature- and Current-dependent On-state Resistance of Planar-gate SiC Power MOSFETs (abstract) PRESENTER: Ivana Kovacevic-Badstuebner |
TCAD Model Parameter Calibration Strategy for 1200V SiC MOSFET (abstract) PRESENTER: Jieun Lee |
Stress fields distribution and simulation in 3C-SiC (111) resonators (abstract) PRESENTER: Francesco La Via |
Design Optimization of a 6.5 kV Split-Gate p-Channel 4H-SiC IGBT (abstract) PRESENTER: Kuan-Min Kang |
Vth Reduction Characterization of Wet-POA treated 4H-SiC p MOSFET (abstract) PRESENTER: Shunto Higashi |
Development and Demonstration of a High Temperature and High Performance Dual Side Cooling SiC Power Module for Automotive Application (abstract) PRESENTER: Gongyue Tang |
Formation of highly doped and defect-free p-type junctions in SiC by using high temperature implants and UV-Laser Annealing (abstract) |
Ohmic contact technology using laser annealing by alloying Ni on 4H-SiC (abstract) PRESENTER: Zeinab Chehadi |
SiC half-bridge modules to improve efficiency and reduce area of high-power motor drives in space (abstract) |
Controlled domain in 3C-SiC epitaxial growth on off-oriented 4H-SiC substrate for water splitting (abstract) PRESENTER: Kongshik Rho |
Influence of substrate quality for SiC Bipolar Degradation at high current levels (abstract) PRESENTER: Wolfgang Bergner |
Suppression and Analysis of Bipolar Degradation in 4H-SiC PiN Diodes through Proton Implantation (abstract) PRESENTER: Atsushi Shimbori |
Trench Etch Processing for SiC Superjunction Schottky Diodes (abstract) PRESENTER: Qinze Cao |
Friday, October 4th
View this program: with abstractssession overviewtalk overview
08:30-10:30 Session 19A: Epitaxial Growth 3
Chairs:
Location: Room 305
08:30 | Spectral Investigation of Various Stacking Faults After Epitaxial Growth of 180m Thick Layer on 4H-SiC substrates (abstract) PRESENTER: David Scheiman |
08:50 | Epitaxial growth of 280 μm thick 4H-SiC on 4°-off substrates for ultra-high-power devices (abstract) PRESENTER: Jawad Ul-Hassan |
09:10 | Formation of alternating epilayers of 4H-SiC and 3C-SiC by simultaneous lateral epitaxy (abstract) PRESENTER: Hiroyuki Nagasawa |
09:30 | Investigation of Dry Transfer of Epitaxial Graphene from SiC(0001) (abstract) PRESENTER: Jenifer Hajzus |
09:50 | Unleashing the Potential of Low Dimensional Silicon Carbide (abstract) PRESENTER: Sakineh Chabi |
10:10 | New insights in Orientation and Growth of 150 mm GaN on SiC for HEMT (abstract) PRESENTER: Cristiano Calabretta |
08:30-10:30 Session 19B: Ion Implantation
Chairs:
Location: Room 306
08:30 | Fabrication of the planer SiC gate-all-around JFET with channel dose modulation (abstract) PRESENTER: Takanori Amamiya |
08:50 | Suppression of stacking-fault expansion in 4H-SiC diodes by helium implantation (abstract) PRESENTER: Tong Li |
09:10 | Simulation of High-energy Channeling Implantation in 4H-SiC (abstract) PRESENTER: Manuel Belanche Guadas |
09:30 | Thermal-oxidation and Ion-implantation-induced Strain in 4H-SiC (abstract) PRESENTER: Helton Goncalves de Medeiros |
09:50 | Isolation Structure for Monolithic Integration of Planar CMOS and 1.7 kV Vertical Power MOSFET on 4H-SiC by High Energy Ion Implantation (abstract) PRESENTER: Quan-Han Chen |
10:10 | Effect of counter-doping on threshold voltage and mobility in SiC p-channel MOSFETs (abstract) PRESENTER: Ryoma Ito |
11:00-12:30 Session 20B: Reliability & Robustness
Chairs:
Location: Room 306
11:00 | Lifetime modeling of MOS based SiC vertical power devices under high voltage blocking stress (abstract) PRESENTER: Ayan Biswas |
11:30 | Challenges of Transient Virtual Junction Temperature Measurement of SiC MOSFETs by VSD(T)-Method for Power Cycling – A Study on Impact Factors (abstract) PRESENTER: Jakob Breuer |
11:50 | Bipolar degradation driven by junction-temperature controlled Power Cycling Milliseconds (PCmsec) in Silicon Carbide Power Devices (abstract) PRESENTER: Sibasish Laha |
12:10 | Investigation of overcurrent turn-off robustness of 1200 V SiC MOSFETs (abstract) PRESENTER: Madhu Lakshman Mysore |
11:10-12:30 Session 20A: Point Defects
Chairs:
Location: Room 305
11:10 | Analysis of Silicon Vacancy Configurations and their Identification (abstract) PRESENTER: Philipp Natzke |
11:30 | Characterization of the charge state of the silicon vacancy in 4H-SiC using low-energy muon spin spectroscopy (abstract) PRESENTER: Maria Mendes Martins |
11:50 | Channeling proton implantation for localized defect control in 4H-SiC: A combined SIMS/DLTS depth profiling study (abstract) PRESENTER: Orazio Samperi |
12:10 | Electrically Detected Magnetic Resonance and Near-Zero Field Magnetoresistance Measurements of Deep Level Defects in GaN Schottky Diodes (abstract) PRESENTER: Artur Solodovnyk |
13:30-15:00 Session 21A: Intrinsic Properties
Chairs:
Location: Room 305
13:30 | Monte Carlo analyses on impact ionization coefficients in 4H-SiC (abstract) PRESENTER: Hajime Tanaka |
14:00 | Low-field and high-field anisotropic electron transport in 4H-SiC (abstract) PRESENTER: Ryoya Ishikawa |
14:20 | Application of photoexcited muon spin spectroscopy to study excess charge carrier lifetimes in 4H-SiC epilayers (abstract) PRESENTER: Tim Niewelt |
14:40 | First principles study of acceptor impurities in 4H-SiC bulk and interfaces (abstract) PRESENTER: Giovanni Alfieri |
13:40-15:00 Session 21B: MOSFET Modeling
Chairs:
Location: Room 306
13:40 | Physically Based Mobility Model for SiC MOSFETs in TCAD (abstract) PRESENTER: Tetsuo Hatakeyama |
14:00 | TCAD Modelling of Anisotropic Channel Mobility in 4H-SiC MOSFETs (abstract) PRESENTER: Hemant Dixit |
14:20 | Influence of Threshold Voltage Mismatch on Switching Behavior of Parallel SiC Power MOSFETs (abstract) PRESENTER: Anja Katerina Brandl |
14:40 | A Physics-Based SPICE Model for a SiC Vertical Power MOSFET (abstract) PRESENTER: Jihun Lim |
15:30-16:30 Session 22: Closing Plenary and ICSCRM 2025 Preview
Chairs:
Location: Combined Rooms 305 & 306
15:30 | SiC Trench MOSFET Design and Concept Considerations |
16:15 | ICSCRM 2024 Closing |
16:20 | ICSCRM 2025 Announcement |