EUROSOI-ULIS 2026: 12TH JOINT EUROSOI WORKSHOP AND INTERNATIONAL CONFERENCE ON ULTIMATE INTEGRATION ON SILICON
TALK KEYWORD INDEX

This page contains an index consisting of author-provided keywords.

1
1/f
1/f noise
1T1R
2
2D Heterostuctures
2D materials
2D semiconductors
2D-exfoliated materials
4
4H-SiC MOS
A
Ab initio simulations
Access resistance
Activation
Activation Functions
Adaptive electronics
AlGaN
AlGaN/GaN HEMT
Aluminum nitride
amorphous semiconductor
analog circuit
Analog Circuit Design
Analog resistive switching
analytical model
Annealing
Annealing-driven self-assembly
Architecture
artificial synapses
B
Back end of line (BEOL)
Back-Enhanced SOI
Back-gate biasing
BEOL
BEOL integration
Better drive current
Beyond Moore Electronics
Beyond-CMOS
Beyond-CMOS electronics
Biasing
biaxial strain
bilayer PtTe2
biomolecule detection
biosensor
biosensors
Box Creep
C
Capacitance
Capacitors
Carrier mobility
Carrier Transport Mechanisms
CFET
Channel-last integration
circuit failure
Circuit implementation
CMOS
CMOS inverter
CMOS technology
CNF/CMF model
Coefficient of Variation (CV)
Compact model
Compensation
Complementary FET
Complementary FET (CFET)
Contact
contact resistance
Core-Shell Junctionless FET
Corner Rounding
Coupling
Cryo-electronics
CryoCMOS
Cryogenic
Cryogenic CMOS
cryogenic electronics
Cryogenic memristors
Cryogenic Temperature
cryogenic temperatures
Cryogenics
Current Mirror
current sensitivity
Current Transfer Ratio
current-voltage characteristics
Cycle to Cycle
D
DC Characterization
DDRFET
Deep Neural Network
defect physics
Defects
defects and stability
density functional theory
Density functional theory (DFT)
depolarization effect
device dimensions
Device modelling
Device Performance
Diamond MOSFET
Diamond MOSFET (DM)
diamond-like carbon
Dielectric
Dielectric BD
Dielectric Mismatch
DIG-RFET
Dirac-source FETs (DSFETs)
Direct bonding
Dopant-free transistors
Doping
Drain Voltage
Drain-extension
E
Edge-Field Engineering
effective potential
electric field
Electric field modulation
electrical characterization
Electromechanical Simulation
Electron density
Electronic structure
Electronic transport parameters
Electrostatic Integrity
Electrostrictive FETs
Enhanced flexibility
F
FD-SOI
FD-SOI MOSFETs
FD-SOI transistors
FDSOI
FDSOI MOSFET
FDSOI n-MOSFET
Ferroelectric
Ferroelectric field-effect transistor (FeFET)
Ferroelectric semiconductor
ferroelectric switching
Ferroelectrics
Field Effect Transistor
Field-effect depletion regions (FEDRs)
Field-effect Transitor
Filament
Filament geometry
filament-free
FinFET
finFETs
Finite element simulation
first principles calculations
First-principles study
flat-band voltage
Forksheet
Forksheet FET
G
GaN
GaN HEMTs
Gate
Gate resistance thermometry
Gate-all-around architecture
Gate-All-Around FET (GAAFET)
Geriatric diagnostics
GeSn
gm/ID Methodology
graphene
graphene field-effect transistor (GFET)
graphene-metal junction
Ground Plane
H
hafnium oxide
Half-Diamond layout style
Halide perovskite
Haptic sensor
Hardware Security
HEMT
HEMTs
Hf1-xZrxO2 Ferroelectric Films
HfO2
High Temperature
High-resistivity silicon (HR-Si)
High-Temperature Analog Performance of MOSFETs
Hole mobility
hot‑carrier degradation
hybrid circuit
Hydrogen states
I
III-V materials
Implantation- and bonding-free fabrication
In-Memory Computing
In-situ thermal annealing
Incomplete Ionization
InGaAs MOSFETs
InGaAs NSFETs
InGaZn oxide
Inner gate
Input Impedance
interconnect
interface dipole engineering
interface engineering
Interface passivation
Interface State Density
Interface States
Internal thermal oxidation
Inversion regime
inverters
Ionization
ISCAS Benchmark Circuits
ITF
ITO
J
junction optimisation
Junctionless
Junctionless FET
Junctionless Nanowire transistor
K
Key
Kolmogorv Arnold Networks
L
LDO Circuit
Leakage Current
LF noise
LIF neuron
lifetime
liquid probe
Liquid–solid interface
Logic Locking
Lorentzian model
low frequency 1/f noise
Low Frequency Noise
Low-Dropout Regulator
Low-frequency noise
Low-power Electronics
M
Machine learning
Magnetron sputtering
Mandrel
materials science
Membrane–cavity architecture
memories
memory
Memristive devices
Memristive Soft Threshold Neuron
memristive switching
Memristor
Metal extension
metal-to-semiconductor transition
Metallic layers
Middle-of-line
Mixed finite element method
Modeling
molybdenum disulfide (MoS2)
Monolithic vs. Sequential Integration
Monte Carlo simulations
MoS2
MOSCAPs
MOSFET
Multi Layer Perceptron
Multi-valued logic
Multilayer SOI
N
n/p doping
nano-fabrication
Nanomaterial engineering
Nanoscle memristor
Nanosheet
Nanosheet FET
Nanosheet transistor
Negative differential transconductance
NEGF
Neural Network
Neuromorphic computing
Neuron
New Channel Materials
New FET architecture
New Gate Layout Style for MOSFETs
Nitrogen
Noise
Noise measurement
Non Quasi Static
Non-Volatile
Novel devices
NSFETs
O
On-wafer measurements
open-gap graphene
Operational Transconductance Amplifier
Optimization
Oxide semiconductors
oxides
P
p-bit
Paired-pulse facilitation
parameter extraction
Parasitic Capacitance
Parasitic surface conduction
Patterning
Performance evaluation
Perovskite memristor
Phosphorus
Physical modelling
Physics-based
Physics-Based Simulation
Piezoelectric 2D Materials
Polymorphic Logic Gates
Potentiation and Depression
pseudo-MOS
Pulsed-DC Magnetron Sputtering
Punch-through
Q
Quantum Confinement
Quantum confinent
Quantum dots
Quantum transport
qubits
R
Radiation-Hardness-By-Design (RHBD)
Radio Frequency Energy Harvestin
Raman spectroscopy
Random dopant fluctuation
Random dopant fluctuations
Random Telegraph Noise
Real Time Calibration
Reconfigurable Field-Effect Transistor (RFET)
Reconfigurable Logic
Reconfigurable Transistors
Reduced SCE
ReRAM
reservoir computing
Resistive Random Access Memory
Resistivity
RF characterisation
RF devices
RF extraction
RF performance
RF-SOI
RFET
ring oscillators
Roughness
RRAM
RRR
Ru Gate Electrode
S
SADP
scaling
Schottky barrier field-effect transistor
Schottky Contact
Schottky FET
Self-Heating
Semiconductor
Short-channel effects
short-term memory
SiGe Stressor Optimization
Silicon
Silicon modulation doping
Silicon nanowires
Silicon nitride
Silicon On Insulator
Silicon thickness
Silicon-on-Insulator
Simulation
single trap
SiO2
Small Signal Modeling
Smart Cut technology
Soft threshold
Spacer Engineering
Spike annealing
spin qubits
Spintronic Logic
SRAM
stability
Stack Nanosheet FET
Stacked MoS₂ channel FETs
Stanford model
Stanford RRAM
Statistical Robustness
Strain
Strain-to-Stress Transduction
Strained Si
Stress Engineering
Substrate
Switching-cycle
Synaptic devices
T
TCAD
TCAD simulation
TCAD simulations
Temperature
Temperature variation
TFET
Thermal Coupling
thin films
threshold switching
Threshold Voltage
Threshold Voltage Engineering
TIG-RFET
TiOx
TMDs
Total Ionizing Dose (TID)
Transconductance
transistor
Transition Metal Dichalcogenides
transparent electronics
Trap recovery
Traps
Triboelectricity
Two-dimensional Electronic Devices
Two-dimensional Materials
U
Ultra Low Power
ultra-low power system
Ultra-thin Ge on SOI
Unconventional Computing
V
Vacancies
van der Waals (vdW) heterostructures
van der Waals interaction
variability
Variability analysis
Verilog-A
Verilog-A Modeling
Vertical GAA
Vertical Mechanical Coupling
Vertical Nanowire
W
WFV
wiring scalability
workfunction variation
WSe2
Y
Y-function method