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Trench Filling Epitaxy
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Improved Angle Tolerance in 4H-SiC Trench Filling Epitaxy Using Chlorinated Chemistry
Rydhem Grover
,
Kelly Turner
,
Gerard Colston
,
Arne Benjamin Renz
,
Marina Antoniou
,
Peter Gammon
,
Phil Mawby
and
Vishal Shah
EasyChair Preprint 14947
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